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Vapor-phase depositionLaajuus (3 ECTS)

Course unit code: TQ00AA62

General information


Credits
3 ECTS

Objective

The students will comprehend, how films are formed from vapor-phase. They will identify factors affecting the properties of coatings. They will know general principals of the most common vapor-phase deposition methods and the opportunities and restrictions of CVD and PVD coatings. The students will also adopt basic vacuum technique.

The students will be able to evaluate the performance of CVD and PVD coatings in different applications. They will be able to select a proper deposition method for a certain substrate and film material fulfilling the required coating properties.

Content

Principals and applications of CVD and PVD coatings. Nucleation, growth and adhesion of PVD coatings. Principals of vacuum and sputtering deposition, ion plating, ion-beam-assisted deposition and arc deposition. The most essential properties of films deposited from vapor-phase. The basic types of vacuum pumps, contamination sources in vacuum chambers.

Ion-implantation, types of DLC-films.

Qualifications

Introduction to Surface Treatment

Further information

Lectures, laboratory assignments, assignment, exam, independent study.

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